| 摘要 |
PROBLEM TO BE SOLVED: To provide a tool for deposition and a deposition device that facilitate deposition. SOLUTION: The tool for deposition has a hat 2 covering a non-deposition surface of a wafer 4. The hat 2 is provided with a first projection 2a and a second projection 2b. The first projection 2a is provided at an outer peripheral part of the hat 2 on the side of the wafer 4, and holds the wafer 4. The second projection 2b is provided at the outer peripheral part of the hat 2 on the opposite side from the wafer 4. Thus, the projections are provided on both the surfaces of the hat 2 to facilitate deposition. COPYRIGHT: (C)2011,JPO&INPIT |
