| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection apparatus capable of detecting a focusing position of an oblique detection system and a position of illumination with high accuracy, and setting the position of illumination with high accuracy. SOLUTION: An illumination system 300 scans a focusing area 202 so as to pass through at a nearly constant rate and acquires an image of a reference chip 205 located close to the focusing area 202. The focusing position is obtained based on the acquired image. Illumination light 301 is moved toward the determined focusing position to acquire one image and calculate an illumination recognition position. A deviation of the focusing position from the illumination recognition position is calculated, and if the deviation is equal to or higher than a tolerance, the illumination system 300 is moved until the deviation becomes equal to or lower than a certain value. COPYRIGHT: (C)2011,JPO&INPIT
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