发明名称 BASE MATERIAL FOR GROWING SINGLE CRYSTAL DIAMOND AND METHOD FOR PRODUCING SINGLE CRYSTAL DIAMOND SUBSTRATE
摘要 The present invention is a base material for growing a single crystal diamond comprising a single crystal silicon substrate, a MgO film heteroepitaxially grown on a side of the single crystal silicon substrate where the single crystal diamond is to be grown, and an iridium film or a rhodium film heteroepitaxially grown on the MgO film. As a result, there is provided a base material for growing a single crystal diamond and a method for producing a single crystal diamond substrate which can grow the single crystal diamond having a large area and good crystallinity and produce a high quality single crystal diamond substrate at low cost.
申请公布号 US2011081531(A1) 申请公布日期 2011.04.07
申请号 US20100876531 申请日期 2010.09.07
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 NOGUCHI HITOSHI
分类号 C30B23/02;B32B7/02;B32B15/04 主分类号 C30B23/02
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