发明名称 EXPOSURE HEAD, AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technology which enables favorable exposure by suppressing the displacement of a relative position between lenses arranged oblique with respect to a longitudinal direction. <P>SOLUTION: The exposure head includes lens arrays which have resin layers where lenses arranged in a second direction oblique with respect to a first direction are arranged in the first direction, and glass substrates on which the resin layers are formed; first support members which support the lens arrays at one side of the second direction with respect to the lenses; and second support members which support the lens arrays at the other side opposite to one side of a second direction with respect to the lenses. The first support members and the second support members are arranged in the second direction. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011068089(A) 申请公布日期 2011.04.07
申请号 JP20090222925 申请日期 2009.09.28
申请人 SEIKO EPSON CORP 发明人 TSUJINO KIYOSHI;SOWA KEN
分类号 B41J2/44;B41J2/45;B41J2/455;H04N1/036 主分类号 B41J2/44
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