发明名称 |
MASK CLEANING METHOD FOR ORGANIC EL, MASK CLEANING DEVICE FOR ORGANIC EL, MANUFACTURING DEVICE OF ORGANIC EL DISPLAY, AND ORGANIC EL DISPLAY |
摘要 |
PROBLEM TO BE SOLVED: To obtain, when removing an organic material adhered to a mask for an organic EL by using laser beam, a high degree of cleaning without damaging the mask for the organic EL beyond restoration. SOLUTION: In a mask cleaning method for the organic EL, an organic material 51 is removed by scanning the laser beam on a surface of the mask 2 for the organic EL to which the organic material 51 is adhered. When irradiating the laser beam L on the mask 2 for the organic EL by transmission through a layer of the organic material 51, the organic material 51 is maintained in a solid state and the laser beam L by which the mask 2 for the organic EL is not deformed after irradiation is irradiated. Moreover, by irradiating the laser beam L, since thermal expansion difference is formed between the organic material 51 and the mask 2 for the organic EL, removal of the organic material 51 is carried out by acting a peeling-off force between the layers. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011071038(A) |
申请公布日期 |
2011.04.07 |
申请号 |
JP20090222762 |
申请日期 |
2009.09.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
YUMIBA KENJI;KATAGIRI KENJI;IZAKI MAKOTO;KATAOKA FUMIO |
分类号 |
H05B33/10;C23C14/04;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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