| 摘要 |
<p>Disclosed is a colored photosensitive resin composition, which exhibits good patterning properties during development and enables the formation of a fine pattern. Specifically disclosed is a colored photosensitive resin composition, which contains a coloring agent including a black coloring material, an alkali-soluble resin, a polymerizable compound having three or more polymerizable groups, a polymerization initiator or a polymerization initiation system, and a solvent. The colored photosensitive resin composition is characterized in that when a photosensitive resin layer, which contains the colored photosensitive resin composition so as to have an optical concentration of 4.0, is formed on a transparent substrate, and then a first pattern is obtained by exposing and developing the photosensitive resin layer through a mask from a side of the photosensitive resin layer, said side being the reverse side of the transparent substrate-side, under such exposure/development conditions that the line width (W1) of the first pattern to the line width (W2) of the mask, namely W1/W2 is within the range of 0.7-1.5 and a second pattern is obtained by exposing and developing the photosensitive resin layer through a mask from the transparent substrate-side of the photosensitive resin layer under the above-described exposure/development conditions, the ratio of the film thickness (d1) of the second pattern to the film thickness (d2) of the first pattern, namely d1/d2 is not less than 0.3.</p> |
