PLASMA PROCESSING APPARATUS AND SLOW-WAVE PLATE USED THEREIN

摘要

Disclosed is a plasma processing apparatus, which is provided with: a planar antenna member, which introduces electromagnetic waves generated by means of an electromagnetic wave generating apparatus into a processing container; a waveguide which supplies the electromagnetic waves to the planar antenna member; and a slow-wave plate, which is provided over the planar antenna member, and changes the wavelength of the electromagnetic waves supplied from the waveguide; a cover member which covers the slow-wave plate and the planar antenna member from above. The slow-wave plate is configured using a dielectric material, and the dielectric constant of the region between the planar antenna member and the cover member is not uniform on the cross-section parallel to the upper surface of the planar antenna member.