| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, roughness characteristics, the resolution and dry etching resistance of an isolated pattern and enables a pattern of good configuration to be formed, and to provide a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit (A) represented by general formula (I) and a repeating unit (B) which generates an acid upon irradiation with actinic rays or radiation. <P>COPYRIGHT: (C)2011,JPO&INPIT |
