发明名称 Low Stress Photo-Sensitive Resin with Sponge-Like Structure and Devices Manufactured Employing Same
摘要 System and method for forming a structure including a MEMS device structure. In order to prevent warpage of a substrate arising from curing process for a sacrificial material (such as a photoresist), and from subsequent high temperature process steps, an improved sacrificial material comprises (i) a polymer and (ii) a foaming agent or special function group. The structure can be formed by forming a trench in a substrate and filling the trench with a sacrificial material. The sacrificial material includes (i) a polymer and (ii) a foaming agent or special function group. After further process steps are completed, the sacrificial material is removed from the trench.
申请公布号 US2011081740(A1) 申请公布日期 2011.04.07
申请号 US20100892190 申请日期 2010.09.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TSAI SHANG-YING;CHENG CHUN-REN;LEE JIOU-KANG;PENG JUNG-HUEI;WU TING-HAU
分类号 H01L21/02 主分类号 H01L21/02
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