| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a laser annealing apparatus that can complete annealing by a small quantity of radiation energy and for a short time period. <P>SOLUTION: Laser pulses extracted from a Nd: YAG laser oscillator 10 is sequentially amplified by Nd: glass lasers 30, 40, 50 and 60 while expanding its beam diameter. A laser beam emitted from the Nd: glass laser 60 is converted into P polarized light with a wavelength of 532 nm for example by a harmonic wave conversion nonlinear crystal 70, and its space intensity distribution is uniformized by a diffraction type beam shaping optical element 80. For example, the beam shape is formed elliptical. A dichroic mirror 81 reflects only the laser beam with a wavelength of 532 nm, and the laser beam enters a concave lens 83 through a mirror 82 and its beam diameter is expanded, and then it is simultaneously directed to an object to be irradiated (wafer W) placed on a placement table 90 inclined by 76.5 degrees for example. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
