<p>PURPOSE: A method for manufacturing a rear electrode type solar cell is provided to minimize the number of processes by easily forming a rear surface field through one ion implantation process and one thermal diffusion process. CONSTITUTION: A first conductive crystalline silicon substrate is prepared(S201). An uneven part is formed on the surface of the first conductive crystalline silicon substrate through a texturing process(S202). A thermal diffusion control layer is formed on the front, rear, and side of the substrate(S203). A p type impurity area is formed on the rear of the substrate by implanting a p type impurity ion(S204). A thermal diffusion control layer is patterned(S205). A p+ emitter area is formed by activating the p type impurity area(S206).</p>
申请公布号
KR101027829(B1)
申请公布日期
2011.04.07
申请号
KR20100004272
申请日期
2010.01.18
申请人
HYUNDAI HEAVY INDUSTRIES CO., LTD.
发明人
JEON, MIN SUNG;LEE, WON JAE;CHO, EUN CHEL;LEE, JOON SUNG