| 摘要 |
<p>Provided is a radiation-sensitive composition that can form a chemical-amplification positive resist that has excellent nano-edge roughness, sensitivity, and resolution and can precisely and stably form small-scale patterns. Also provided are a polymer, a monomer, and a manufacturing method therefor. The provided radiation-sensitive composition contains: an acid-labile-group-containing polymer that contains a repeating unit represented by general formula (1); and a radiation-sensitive acid-generating agent. (1) (In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; R2 represents a substituted or unsubstituted C6-22 aryl group; Y represents a carbon atom; X represents -X1Z1X2-, a group of atoms required to form a heteroatom-containing cyclic structure together with Y; Z1 represents -O-, -S-, -CO-, -COO-, -SO-, or -SO2-; X1 and X2 may be the same as or different from each other and each represent a single bond, a methylene group, or a C2-25 alkylene group; and a carbon atom in X1 may be bonded to a carbon atom in X2 in a divalent group.)</p> |
