| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polarized exposure apparatus, which can carry out, on exposing a plurality of portions on a substrate by use of a light-shielding mask, exposure of the plurality of portions with high accuracy in a short time by aligning the substrate to the light-shielding mask only once. <P>SOLUTION: The exposure apparatus includes: moving to an exposure position by mechanical operations of a light-shielding mask or a substrate stage on the basis of the information about a medium to be exposed by referring to a position set by a single alignment; stopping at the set exposure position; and carrying out exposure, after moving to the exposure position, under exposure conditions calculated by an exposure condition calculating mechanism. <P>COPYRIGHT: (C)2011,JPO&INPIT |
