METHOD FOR FORMING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To achieve a nanometer-scale feature size in a semiconductor device.

SOLUTION: A method for forming an electronic device includes: forming a first layer 106 of a first photosensitive composition containing a first resin component and a first photo active component; exposing the first layer to active radiation through a patterned photomask 110 and developing it to form a first resist pattern 112; heat-treating the first resist pattern in a hard baking process; treating the hard-baked first resist pattern with a substance effective to alkalize the surface; applying a second layer 114 of a second photosensitive composition which contains a second resin component and a photoacid generating agent and is a positive type in contact with the alkaline surface of the first resist pattern; exposing the second layer to the active radiation through the patterned photomask 116; and developing the exposed second layer, thereby forming the second resist pattern 114.

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