BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPOSED OF THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in resolution, is low-cost, and has a wide range of selection applicable to a structure of a polymer precursor of which the reaction to produce an end product is promoted by a basic substance or by heating in the presence of the basic substance, and to provide a base generator used for such a kind of photosensitive resin composition.

SOLUTION: The base generator has a predetermined structure and generates a base with electromagnetic wave irradiation and heating, and the photosensitive resin composition includes the base generator and the polymer precursor of which the reaction to produce the end product is promoted by the basic substance or by heating in the presence of the basic substance.

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