Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat

摘要

A titania-doped quartz glass containing 3-12 wt% of titania at a titania concentration gradient less than or equal to 0.01 wt%/µm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
A method for preparing the titania-doped quartz glass by flame hydrolysis is also defined.