发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTOSPACER, PHOTOSENSITIVE RESIN TRANSFER MATERIAL, PHOTOSPACER AND PROCESS FOR PRODUCTION THEREOF, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
<p>Disclosed is a photosensitive composition for producing a photospacer that can withstand vibrations having high frequencies. The photosensitive composition comprises a resin (A) having an acidic group in a side chain thereof, a polymerizable compound (B), a photopolymerization initiator (C), and surface-treating microparticles (D) that contain surface-treating double bonds in an amount of 0.02 to 0.35 mmol per 1 g.</p> |
申请公布号 |
WO2011040413(A1) |
申请公布日期 |
2011.04.07 |
申请号 |
WO2010JP66852 |
申请日期 |
2010.09.28 |
申请人 |
FUJIFILM CORPORATION;GOTOH, HIDENORI |
发明人 |
GOTOH, HIDENORI |
分类号 |
G02F1/1339;G03F7/004;G03F7/075;G03F7/11 |
主分类号 |
G02F1/1339 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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