发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTOSPACER, PHOTOSENSITIVE RESIN TRANSFER MATERIAL, PHOTOSPACER AND PROCESS FOR PRODUCTION THEREOF, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>Disclosed is a photosensitive composition for producing a photospacer that can withstand vibrations having high frequencies. The photosensitive composition comprises a resin (A) having an acidic group in a side chain thereof, a polymerizable compound (B), a photopolymerization initiator (C), and surface-treating microparticles (D) that contain surface-treating double bonds in an amount of 0.02 to 0.35 mmol per 1 g.</p>
申请公布号 WO2011040413(A1) 申请公布日期 2011.04.07
申请号 WO2010JP66852 申请日期 2010.09.28
申请人 FUJIFILM CORPORATION;GOTOH, HIDENORI 发明人 GOTOH, HIDENORI
分类号 G02F1/1339;G03F7/004;G03F7/075;G03F7/11 主分类号 G02F1/1339
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