发明名称 Herstellungsverfahren eines TFT-Array-Substrats
摘要 <p>Gate and source electrodes (106,108) are connected to intersecting gate and data lines (102,104), respectively. A passivation layer is formed on a semiconductor layer that forms a channel between the source electrode and drain electrode (110). A gate pad (150) has a lower electrode (152) that extends from the gate line, while a data pad (160) has a bottom electrode (162) that separates from the data line. An independent claim is also included for a thin film transistor (TFT) array substrate manufacturing method.</p>
申请公布号 DE102005058680(B4) 申请公布日期 2011.04.07
申请号 DE20051058680 申请日期 2005.12.08
申请人 LG DISPLAY CO. LTD. 发明人 CHOI, YOUNGSEOK;YU, HONGWOO;CHO, KISUL;LEE, JAEOW;JUNG, BOKYONG
分类号 H01L21/84;G02F1/1333;H01L27/12 主分类号 H01L21/84
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