ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that has improved performance of Line Width Roughness and Depth of Focus and also adapted to a liquid immersion process with a line width of ≤45 nm, and to provide a pattern forming method employing the same.

SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition includes: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein a molar extinction coefficient ε of the compound (PA) at a wavelength of 193 nm as measured in acetonitrile solvent is 55,000 or less. The pattern forming method uses the composition.

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