IMPROVED POST-TEXTURING CLEANING METHOD FOR PHOTOVOLTAIC SILICON SUBSTRATES

摘要

An improved method for post-texturing cleaning, surface conditioning, and rinsing silicon wafers or similar surfaces, with particular, although not exclusive, applicability in photovoltaic applications which includes cleaning the surfaces sequentially with dilute HF/HCI and dilute oxidizing rinse, particularly following texturing with concentrated HF/HNO3 and/or KOH. The method allows for the recycling of the oxidizing rinse in t dilute HF/HCI and other upstream rinse steps.