FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a fluid handling system that maintains a liquid in a space between a final element of a projection system and a substrate.

SOLUTION: The fluid handling structure for a lithographic apparatus includes, at a boundary between the space in which an immersion fluid is confined and an external region of the fluid handling structure: a first gas knife device having a plurality of openings arranged in a first column and an aperture in a second column; and a second gas knife device having one or a plurality of openings in a third array and an aperture in a fourth column.

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