SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE, AND METHOD FOR PREPARING SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a target which suppresses the generation of nodules when a transparent conductive oxide is formed by a sputtering process, and can stably perform sputtering; to provide a transparent conductive oxide composed of the target; and to provide a method for preparing the sputtering target.

SOLUTION: A transparent conductive oxide is film-deposited from a sputtering target comprising at least indium oxide and zinc oxide; the atomic ratio represented by In/(In+Zn) is set to a value within the range of 0.75 to 0.97; a hexagonal layered compound represented by In2O3(ZnO)mwherein m is an integer of 2 to 20 is contained, and the crystal grain size of the hexagonal layered compound is set to a value of 5 μm or less.

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