IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND TARGET OBJECT COATING METHOD

摘要

Disclosed is a technology for a lithography system. According to one embodiment of the present invention, the lithography system comprises: at least one target object which is disposed on a substrate; a processor which determines optical patterns for coating layers of the at least one target object by performing the image processing for the at least one target object; and an exposure device which provides the light having the optical patterns determined by the processor to the substrate.