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发明名称
Plasmaätzverfahren für eine Fotomaske unter Verwendung einer geschützten Maske
摘要
申请公布号
DE602006020202(D1)
申请公布日期
2011.04.07
申请号
DE200660020202T
申请日期
2006.01.26
申请人
APPLIED MATERIALS INC.
发明人
CHANDRACHOOD, MADHAVI;KUMAR, AJAY;YAU, WAI-FAN
分类号
G03F1/00
主分类号
G03F1/00
代理机构
代理人
主权项
地址
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