SUBSTRATE TREATMENT DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device in which footprint can be suppressed. SOLUTION: The substrate treatment device includes: a substrate holder holding a substrate; an ion source generating ions; a target irradiated with ions generated from the ion source; a rotary shaft arranged in such a manner that the substrate holder is located in the elongating direction of the shaft; a plurality of elongating parts elongating to directions vertical to the rotary shaft and also to the different directions; target chucks respectively provided at the elongating parts and holding each target in such a manner that the distance between the rotary shaft and the target is shortened as it is made close to the substrate holder side; and a rotary device rotating the rotary shaft. COPYRIGHT: (C)2011,JPO&INPIT