OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY

摘要

The invention concerns an optical arrangement in a projection exposure apparatus for EUV lithography, comprising a multiplicity of optical elements (101, 102) and a carrier structure (100, 300) which carries the optical elements (101, 102), wherein the carrier structure is composed of at least two releasably interconnected modules (110-140, 310-340, 510, 610), and wherein each module (110-140, 310-340, 510, 610) is composed of at least one carrier structure subelement (121-124, 421, 511 -514, 612-614), wherein a subhousing is produced by a multiplicity of carrier structure subelements (121-124, 421, 511-514, 612-614) and/or modules (110-140, 310, 340, 510, 610), and wherein said subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in said projection exposure apparatus, said usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus.