发明名称 SURFACE TREATMENT DEVICE AND SURFACE TREATMENT METHOD
摘要 <p>Disclosed is a surface treatment device that is capable of forming a desired hydrophilic pattern. A plasma generation device (1) has a plurality of microplasma sources that have been disposed in a linear fashion, and the activation and deactivation of microplasma generation in each microplasma source can be independently controlled by a control device (2). While a flexible substrate (5) is rolled up by a scanning means (3), the activation and deactivation of each microplasma generation is controlled by the control device (2) on the basis of data on the desired hydrophilic pattern, and the surface of the flexible substrate (5) is irradiated with the microplasma. As a result, the desired hydrophilic pattern can be formed upon the surface of the flexible substrate (5).</p>
申请公布号 WO2011039982(A1) 申请公布日期 2011.04.07
申请号 WO2010JP05755 申请日期 2010.09.23
申请人 FUJI MACHINE MFG. CO., LTD.;NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY;HORI, MASARU;KODAMA, SEIGO;TSUKADA, KENJI;KAWAJIRI, AKIHIRO 发明人 HORI, MASARU;KODAMA, SEIGO;TSUKADA, KENJI;KAWAJIRI, AKIHIRO
分类号 H05H1/24;H05K3/10;H05K3/38 主分类号 H05H1/24
代理机构 代理人
主权项
地址