TREATMENT DEVICE FOR VACUUM DEPOSITION

摘要

Provided is a treatment device for vacuum deposition, which comprises a cabinet body with a hollow structure forming a hermetical chamber, an evaporation source disposed inside the hermetical chamber and a substrate disposed inside the hermetical chamber and above the evaporation source. Among others, the device also includes a shutter construction which comprises a shutter, a magnetic fluid, a cooling shaft and a shutter driving mechanism, the magnetic fluid is installed in the cabinet body; the shutter driving mechanism is positioned outside the cabinet body and connected to one end of the cooling shaft, another end of the cooling shaft extends as a pivot through the magnetic fluid and into the hermetical chamber; the shutter is connected immovably to the cooling shaft and is disposed inside the hermetical chamber and between the evaporation source and the substrate to partition or communicate the space between them; the shutter driving mechanism drives the cooling shaft which rotates the shutter. On one hand, the treatment device allows the quality of the film coated on the substrate to be improved by the greatest extent; on the other hand, the normal life thereof is prolonged by the greatest extent.