发明名称 SUBSTRATE TREATING SYSTEM AND SUBSTRATE CONVEYING METHOD
摘要 <p>PURPOSE: A substrate processing system and substrate transferring method are provided to improve processing capability by using a substrate transfer device for more rapidly returning a substrate. CONSTITUTION: A substrate processing system a posting support, a second substrate accepting part, a substrate transfer device(50), and a control device. The first substrate accepting part is located on the posting support. The first substrate accepting part accepts substrates with piled. The second substrate accepting part accepts a plurality of substrates. The substrate transfer device returns the substrate from the first substrate receiver to the second substrate accepting part. The substrate transfer device comprises a fork supporting part and forks(54a,54b). The fork supporting part moves up and down toward the first substrate receiver and the second substrate accepting part. The control device controls each fork of the substrate transfer device.</p>
申请公布号 KR20110036567(A) 申请公布日期 2011.04.07
申请号 KR20110026043 申请日期 2011.03.23
申请人 TOKYO ELECTRON LIMITED 发明人 MURATA AKIRA;ENOKIDA SUGURU;DOUKI YUICHI
分类号 B65G49/07;H01L21/677;H01L21/68 主分类号 B65G49/07
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