发明名称 Multi-layer electrode, cross point memory array and method of manufacturing the same
摘要 Provided may be a multi-layer electrode, a cross point resistive memory array and method of manufacturing the same. The array may include a plurality of first electrode lines (21) arranged parallel to each other; a plurality of second electrode lines (25) crossing the first electrode lines and arranged parallel to each other; and a first memory resistor (22) at intersections between the first electrode lines and the second electrode lines, wherein at least one of the first electrode lines and the second electrode lines have a multi-layer structure including a first conductive layer and a second conductive layer formed of a noble metal.
申请公布号 EP2048713(A3) 申请公布日期 2011.04.06
申请号 EP20080163599 申请日期 2008.09.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, CHANGBUM;PARK, YOUNGSOO;LEE, MYOUNGJAE;GENRIKH, STEFANOVICH;KIM, KIHWAN
分类号 H01L27/24;G11C13/00;H01L45/00 主分类号 H01L27/24
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