| 摘要 |
PURPOSE: An inspecting apparatus and an inspecting method are provided to enable the formation of the area whose the quantity of emission of the secondary electron is lower than that of a conductive part. CONSTITUTION: A mounting unit for mounting a substrate is formed in a vacuum container(21). A vacuum exhaust unit discharges air inside the vacuum container in vacuum. The electronic beam emitting unit emits the electronic beam to the substrate. The movable part relatively moves the irradiation position of the electronic beam and the mounting unit(22). An electron detection unit(35) detects the secondary electron emitted from the substrate with the irradiation the electronic beam.
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