Lithography system

摘要

The invention relates to a maskless electron beam lithography system for transferring a pattern onto the surface of a target by a plurality of beamlets. The system includes a modulation means and a control unit. The modulation means includes an aperture plate comprising electrostatic deflectors for deflecting beamlets passing through the apertures in the aperture plate in dependence on received pattern data and light sensitive elements for converting an incoming light signal into an electric signal. The control unit is arranged for delivering pattern data in the form of digital computer data to the modulation means, and includes elements for converting the digital computer data into pattern data carrying light beams, and means to transfer the pattern data carrying light beams via free space optical interconnects towards the light sensitive elements of the modulation means.