SUBSTRATE TREATMENT APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to limit the interference of the downstream and block member by forming the downstream of cylinder shape surrounding the block member in the process chamber. CONSTITUTION: A process chamber(4) processes a substrate(W) in the inside. A substrate support unit(17) supports the substrate from the inside of the process chamber. A block member(14) comprises a opposed surface facing the substrate support unit. An air supply unit(7) is formed in ring shape surrounding the block member.