发明名称 PLASMA DIAGNOSIS APPARATUS AND THE SIGNAL PROCESSING METHOD OF THE SAME
摘要 PURPOSE: A plasma diagnosis device and a signal processing method thereof are provided to accurately measure plasma variables including plasma density, an electronic temperature, plasma potential and floating potential by measuring AC inputted from plasma. CONSTITUTION: A driving unit(180) outputs a periodic voltage signal of a driving frequency. A circuit between the driving unit and a probe electrode is comprised of a preliminary equivalent resistor(Rs) and a parasitic capacitor(Cs) which is serially connected to a preliminary equivalent resistor. A parasitic current flows through the parasitic capacitor. A probe electrode(110) and the plasma are comprised of a plasma capacitor and a plasma resistor serially connected to the plasma capacitor. An input current flowing through the driving unit is shown as the vector sum of the plasma current and the parasitic current.
申请公布号 KR20110034746(A) 申请公布日期 2011.04.06
申请号 KR20090092150 申请日期 2009.09.29
申请人 CHUNG, CHIN WOOK 发明人 CHUNG, CHIN WOOK;LEE, SHIN HYUNG;KIM, YU SIN
分类号 H01L21/205;H01L21/3065;H01L21/66;H05H1/36 主分类号 H01L21/205
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