发明名称 |
PLASMA DIAGNOSIS APPARATUS AND THE SIGNAL PROCESSING METHOD OF THE SAME |
摘要 |
PURPOSE: A plasma diagnosis device and a signal processing method thereof are provided to accurately measure plasma variables including plasma density, an electronic temperature, plasma potential and floating potential by measuring AC inputted from plasma. CONSTITUTION: A driving unit(180) outputs a periodic voltage signal of a driving frequency. A circuit between the driving unit and a probe electrode is comprised of a preliminary equivalent resistor(Rs) and a parasitic capacitor(Cs) which is serially connected to a preliminary equivalent resistor. A parasitic current flows through the parasitic capacitor. A probe electrode(110) and the plasma are comprised of a plasma capacitor and a plasma resistor serially connected to the plasma capacitor. An input current flowing through the driving unit is shown as the vector sum of the plasma current and the parasitic current.
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申请公布号 |
KR20110034746(A) |
申请公布日期 |
2011.04.06 |
申请号 |
KR20090092150 |
申请日期 |
2009.09.29 |
申请人 |
CHUNG, CHIN WOOK |
发明人 |
CHUNG, CHIN WOOK;LEE, SHIN HYUNG;KIM, YU SIN |
分类号 |
H01L21/205;H01L21/3065;H01L21/66;H05H1/36 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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