| 摘要 |
PURPOSE: A dry-film photo-resist is provided to prevent the reduction of a transparent property and the reduction of developing speed by preventing the bad effect of an exposing process due to a supporting film. CONSTITUTION: A dry-film photo-resist includes a supporting film, a resin protective layer, and a photo-resist resin layer. The resin protective layer includes water-soluble polymer and alkoxyalcohol. The amount of alkoxyalcohol in the resin protective layer is less than 30000ppm. The alkoxyalcohol is butoxyethanol. The water-soluble polymer is dissolved in a solvent including water and the alkoxyalcohol. The dissolved polymer is coated on the supporting film in order to obtain the resin protective layer. |
