发明名称 |
EVAPORATION SOURCE OF A DEPOSITION SYSTEM AND CONTROL METHOD THEREOF |
摘要 |
PURPOSE: An evaporation source of a deposition system, capable of deposition material input is provided to improve quality of thin film by preventing the exposing of a thin film remainder to a high temperature atmosphere after inputting the material into an evaporation source part. CONSTITUTION: An evaporation source of a deposition system comprises follows. An automatic feed unit(20) includes a depositing material storage(30), a depositing material feed port(40) and a controller(60). The depositing material feed port supplies the depositing material to an evaporation source part(2) through the forwarding and rotating motion The controller controls the depositing material storage and depositing material feed port.
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申请公布号 |
KR20110034139(A) |
申请公布日期 |
2011.04.05 |
申请号 |
KR20090091551 |
申请日期 |
2009.09.28 |
申请人 |
SUNIC SYSTEM. LTD. |
发明人 |
KIM, JONG WOON;HWANG, IN HO;KIM, SUN HYUK |
分类号 |
C23C14/24;H01L51/56 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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