发明名称 ROM cell array structure
摘要 A semiconductor memory cell array is disclosed which comprises an elongated continuous active region, a first transistor formed in the elongated continuous active region, the first transistor forming a first single-transistor memory cell, a second transistor also formed in the elongated continuous active region, the second transistor forming a second single-transistor memory cell and being the closest memory cell to the first single-transistor memory cell along the elongated direction, and an isolation gate formed on the elongated continuous active region between the first and second transistor, wherein the isolation gate has substantially the same structure as gates of the first and second transistor, and is supplied with a predetermined voltage to shut off any active current across a section of the elongated continuous active region beneath the isolation gate.
申请公布号 US7920403(B2) 申请公布日期 2011.04.05
申请号 US20080039711 申请日期 2008.02.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIAW JHON JHY
分类号 G11C17/00 主分类号 G11C17/00
代理机构 代理人
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