发明名称 Copper die bumps with electromigration cap and plated solder
摘要 Embodiments of the invention include apparatuses and methods relating to copper die bumps with electtomigration cap and plated solder. In one embodiment, an apparatus comprises an integrated circuit die, a plurality of copper bumps on a surface of the die, electromigration(EM) caps substantially covering a mating surface of the copper bumps capable of controlling intermetallic formation between the cooper bumps and solder, and solder plating on the EM caps capable of protecting the EM caps from oxidation prior to packaging.
申请公布号 US7919859(B2) 申请公布日期 2011.04.05
申请号 US20070728082 申请日期 2007.03.23
申请人 INTEL CORPORATION 发明人 ZHONG TING;DUBIN VAL;BOHR MARK
分类号 H01L23/48 主分类号 H01L23/48
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