发明名称 Methods for placing substrates in contact with molten solder
摘要 Methods and devices for placing a semiconductor wafer or other substrate in contact with solder are described. A wave soldering apparatus includes a solder bath, a nozzle for producing a solder wave, and a jig for orienting a substrate in a substantially vertical orientation and placing the substrate in contact with a cascading solder wave. In another wave soldering apparatus, a jig orients a semiconductor wafer in a substantially horizontal orientation in contact with the solder wave. Another soldering apparatus includes a tank comprising molten solder and a fixture configured to orient one or more semiconductor wafers in a substantially vertical orientation. Methods of placing semiconductor wafers or other substrates in contact with solder using the devices of the present invention are also disclosed.
申请公布号 US7918383(B2) 申请公布日期 2011.04.05
申请号 US20050140420 申请日期 2005.05.27
申请人 MICRON TECHNOLOGY, INC. 发明人 KIRBY KYLE K.;AKRAM SALMAN;CRAM DANIEL P.;LANGE ROY T.;FARNWORTH WARREN M.
分类号 B23K31/02 主分类号 B23K31/02
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