| 摘要 |
PURPOSE: A dry film photo-resist is provided to obtain the superior the glossiness of a photo-resist resin layer by preventing the mixture of a resin protective layer and the photo-resist resin layer. CONSTITUTION: A dry film photo-resist includes successively a support film, a resin protective layer, and a photo-resist resin layer. The resin protective layer includes water soluble polymer, the average molecular weight of which is between 5000 and 300000. The haze of the resin protective layer is less than 3.0%. The water soluble polymer includes polyvinyl alcohol, the saponification ratio of which is between 75 and 97%. |
