| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminate structure that achieves precise exposure of an imprint original plate by laser with small variance in size of an exposure range against variation in film thickness of an etching layer. <P>SOLUTION: The laminate structure includes a substrate 11 of 0.5 to 10 in extinction coefficient X within a wavelength range of 300 to 700 nm, a light absorbing layer provided on the substrate 11, an etching layer 13 provided on the light absorbing layer 12, and a resist layer 14 provided on the etching layer 13. <P>COPYRIGHT: (C)2011,JPO&INPIT |
