发明名称 AMORPHOUS OXIDE SEMICONDUCTOR MATERIAL, FIELD-EFFECT TRANSISTOR, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an amorphous oxide semiconductor material that reduces light absorption to light having a wavelength within a visible-light short-wavelength range of 400 to 420 nm. SOLUTION: There is provided the amorphous oxide semiconductor material including an amorphous oxide semiconductor including In, Ga and Zn, wherein when In:Ga:Zn=a:b:c denotes an element composition ratio of the oxide semiconductor, the element composition ratio is defined by the range of a+b=2 and b<2 and c<4b-3.2 and c>-5b+8 and 1≤c≤2. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011066375(A) 申请公布日期 2011.03.31
申请号 JP20100002370 申请日期 2010.01.07
申请人 FUJIFILM CORP 发明人 HAMA IFUMI;SUZUKI MASAYUKI;TANAKA ATSUSHI;MOCHIZUKI FUMIHIKO
分类号 H01L29/786;H01L51/50 主分类号 H01L29/786
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