The present invention relates to a slurry for chemical mechanical polishing, comprising an abrasive; an oxidant; an organic acid; and a polymeric additive comprising polyolefin-polyalkyleneoxide copolymer, wherein the polyolefin-polyalkyleneoxide copolymer comprises a polyolefin repeat unit and two or more polyalkyleneoxide repeat units, and at least one polyalkyleneoxide repeat unit is branched.
申请公布号
WO2010123300(A3)
申请公布日期
2011.03.31
申请号
WO2010KR02537
申请日期
2010.04.22
申请人
LG CHEM, LTD.;CHOI, EUN-MI;SHIN, DONG-MOK;CHO, SEUNG-BEOM