| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing apparatus which prevents a substrate as an object to be polished, from coming off, and provides stable polishing. <P>SOLUTION: The polishing apparatus has: a polishing pad 101 having a polishing surface; a top ring body 2 that holds a substrate W and presses the substrate W against the polishing surface to polish the substrate; and a retainer ring 3 that holds an outer peripheral part of the substrate W and presses the polishing surface. The polishing apparatus is further equipped with: a sensor 506 that detects the height of the retainer ring 3 in at least two positions; and a computing unit 508 that computes the inclination of the retainer ring 3 from the height detected by the sensor 506. <P>COPYRIGHT: (C)2011,JPO&INPIT |
