发明名称 GAS-SUPPLYING DEVICE AND VACUUM TREATMENT APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas-supplying device which can match timings at which discharge gases are supplied to each cathode, can enhance the responsiveness of the gas, maintainability and further reliability, and can reduce the cost. <P>SOLUTION: The gas-supplying device includes: a chamber frame; a door which is installed in the chamber frame so as to be openable and closable and is provided with a cathode; a door-side introduction block which is installed in the door and has a gas channel for supplying the discharge gas to the cathode therethrough; and a chamber-side introduction block which is installed in the chamber frame and has a gas channel for supplying the discharge gas introduced from the outside of the chamber frame to the door-side introduction block therethrough. When the door is closed, the gas channel of the door-side introduction block is communicated with the gas channel of the chamber-side introduction block. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011063876(A) 申请公布日期 2011.03.31
申请号 JP20100175719 申请日期 2010.08.04
申请人 CANON ANELVA CORP 发明人 UENO NOBUHIKO;MIYAUCHI NOBUHITO;WAKABAYASHI HIDENORI
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
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