发明名称 LOW THERMAL EXPANSION GLASS FOR EUVL APPLICATION
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a low thermal expansion glass which has stable thermal expansion in a temperature range wider than that in the present ULE glass and can be polished so as to satisfy surface roughness requirements. <P>SOLUTION: The low thermal expansion glass includes a base glass material 3 having a front surface 5, a back surface 7, and a thickness T; and a glass coating material 9 applied on at least the front surface 5 of the base glass material 3. The base glass material 3 consists essentially of 10 wt.% to 20 wt.% titania and 80 wt.% to 90 wt.% silica. The glass coating material 9 also consists essentially of titania and silica, but the total amount of titania in the glass coating material 9 is lower than the total amount of titania in the base glass material 3. The base glass material 3 preferably has a coefficient of thermal expansion of substantially zero in the temperature range of about 10 to 100°C. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011063505(A) 申请公布日期 2011.03.31
申请号 JP20100192019 申请日期 2010.08.30
申请人 CORNING INC 发明人 HRDINA KENNETH E;MUELLER MICHAEL A;STAINBROOK BARBARA L
分类号 C03C3/06;C03C19/00 主分类号 C03C3/06
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