| 摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of performing ion irradiation by removing neutral particles. SOLUTION: In the focused ion beam device, a deflector has a four-stage structure, and a deflector power supply and a shielding plate 11 are provided. The deflector power supply has a function of superimposing and applying each voltage component for shifting an ion beam in parallel by a certain distance by the upper two stages and for shifting the ion beam in parallel by the lower two stages return the ion beam again to an original track by the upper two stages on an electrode of each stage, respectively. The shielding plate 11 is disposed between electrodes of upper two stages and electrodes of lower two stages and blocks the neutral particle. When a deflector voltage for allowing the upper two stages and lower two stages of the deflector to perform a role of an original two-stage deflecting system is applied, the deflector voltage for achieving the original two-stage deflecting system is applied only on any one stage of the upper two stages and any one stage of the lower two stages. COPYRIGHT: (C)2011,JPO&INPIT
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