| 摘要 |
PROBLEM TO BE SOLVED: To provide a carbon film deposition method for depositing a very hard and dense carbon film with a uniform thickness. SOLUTION: Gas G containing carbon as a raw material is introduced into a pressure-reduced film depositing chamber 101. The gas G as the raw material is ionized by electrical discharge between a filament cathode electrode 104 heated by energization and an anode electrode 105 disposed around the electrode 104. When the surface of a substrate D is irradiated with the accelerated ionized gas, a magnetic field is applied to an exciting space in the film depositing chamber 101 by a magnet 109, and a carbon film is deposited while rotating the magnet 109 disposed around the exciting space in a circumferential direction. COPYRIGHT: (C)2011,JPO&INPIT
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