| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To eliminate defect occurring to only a pattern of a local part by a simple technique. <P>SOLUTION: A charged particle beam drawing apparatus 10 that draws a desired pattern by irradiating a sample M coated with resist with a charged particle beam 10a1b forms a map having a plurality of meshes, forms a representative figure having area equal to total area of figures positioned in each mesh, and calculates a proximity effect correction irradiation amount of a charged particle beam of the each mesh based upon the area of the representative figure positioned in the each mesh. When there is a figure which needs to be changed in proximity effect correction irradiation amount, the area of the figure which needs to be changed in proximity effect correction irradiation amount is changed before the representative figure is formed, and a proximity effect correction irradiation amount of a charged particle beam for drawing a pattern corresponding to the figure which needs to be changed in proximity effect correction irradiation amount among calculated proximity effect correction irradiation amounts of charged particle beams is changed. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
