发明名称 |
STRUCTURE AND PROCESS FOR PRODUCING SAME |
摘要 |
Provided is a structure having improved electrical reliability. The structure includes a first inorganic insulating layer (11a) which comprises amorphous-state silicon oxide and has a modulus of 45 GPa or lower. Also provided is a process for producing a structure, the process comprising the step of applying an inorganic insulating sol (11x) containing first inorganic insulating particles (14a) constituted of amorphous-state silicon oxide and the step of heating the first inorganic insulating particles (14a) at a temperature lower than the crystallization initiation temperature of the silicon oxide and connecting the particles to one another to thereby form a first inorganic insulating layer (11a) which comprises amorphous-state silicon oxide and has a modulus of 45 GPa or lower. |
申请公布号 |
WO2011037265(A1) |
申请公布日期 |
2011.03.31 |
申请号 |
WO2010JP66865 |
申请日期 |
2010.09.28 |
申请人 |
KYOCERA CORPORATION;HAYASHI, KATSURA |
发明人 |
HAYASHI, KATSURA |
分类号 |
H05K3/46;H05K1/02;H05K1/03 |
主分类号 |
H05K3/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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