发明名称 STRUCTURE AND PROCESS FOR PRODUCING SAME
摘要 Provided is a structure having improved electrical reliability. The structure includes a first inorganic insulating layer (11a) which comprises amorphous-state silicon oxide and has a modulus of 45 GPa or lower. Also provided is a process for producing a structure, the process comprising the step of applying an inorganic insulating sol (11x) containing first inorganic insulating particles (14a) constituted of amorphous-state silicon oxide and the step of heating the first inorganic insulating particles (14a) at a temperature lower than the crystallization initiation temperature of the silicon oxide and connecting the particles to one another to thereby form a first inorganic insulating layer (11a) which comprises amorphous-state silicon oxide and has a modulus of 45 GPa or lower.
申请公布号 WO2011037265(A1) 申请公布日期 2011.03.31
申请号 WO2010JP66865 申请日期 2010.09.28
申请人 KYOCERA CORPORATION;HAYASHI, KATSURA 发明人 HAYASHI, KATSURA
分类号 H05K3/46;H05K1/02;H05K1/03 主分类号 H05K3/46
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